Xenon is proud to announce receipt of United States Patent 9,228,865 for its own “Multi-Analyzer And Multi-Reference Sample Validation System And Method”.
Xenon’s validation system has the ability to simultaneously, or sequentially validate Reid Vapor Pressure (RVP) or other properties of process samples taken from the same, or different sources. The system is scalable to validate with multiple reference samples to one, or multiple analyzers, and is also scalable to operate multiple streams of a single, or multiple fuels to multiple analyzers.
Xenon’s patented validation system is specially designed to be field-installed as an integral component in most process optimization schemes. The system enables installed analyzers to attain their full potential, realizing significant economic credits utilizing effective sample distribution and bias management techniques.
